Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference ph模拟和实验结果表明，对点阵或孔阵图形，在同样的图形尺度下，无掩模干涉光刻比传统光刻简单得多。
The beam division method in maskless laser interference photolithography can be divided into wave-front division and amp摘要无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。