1 The device manufacturing method according to claim 13, wherein the generating is performed on the basis of known correspondence between changes in imaging adjustments of the adjustment system and the aberration changes being compensated for by such imag
1 The device manufacturing method according to claim 13, wherein the generating is performed on the basis of known correspondence between changes in imaging adjustments of the adjustment system and the aberration changes being compensated for by such imag
根据权利要求13的设备制造装置,其中该产生技术是以调节系统的成像调节和通过成像调节系统给予失真补偿的相关已知技术为基础执行操作的.