The device manufacturing method according to claim 13, wherein the generating is performed on the basis of known correspondence between changes in imaging adjustments of the adjustment system and the aberration changes being compensated for by such imagin
The device manufacturing method according to claim 13, wherein the generating is performed on the basis of known correspondence between changes in imaging adjustments of the adjustment system and the aberration changes being compensated for by such imagin
如请求项13之设备制造方法，该设备的制造是以调节系统的成像调节变化和由这种成像调节所补偿的像差之间的相似之处为理论基础的。