C.J. Tsai and K.H. Yu, Stress Evolution during Isochronal Annealing of Ni/Si System; Thin Solid Films, 350, 91 (1999).
C.J. Tsai and K.H. Yu, Stress Evolution during Isochronal Annealing of Ni/Si System; Thin Solid Films, 350, 91 (1999).
郭升鑫、蔡哲正，「在钴/钛/矽与钴/镍/矽系统不同中间层对钴矽化物生成的影响」，兴大工程学刊，第十一卷，第一期、53页，2000.