A fast computer simulation of diffraction intensity on the photoresist surface was performed based on Kirchhoff's diffraction theory and the incoherent super-impose of multi-point source diffraction intensity.
A fast computer simulation of diffraction intensity on the photoresist surface was performed based on Kirchhoff's diffraction theory and the incoherent super-impose of multi-point source diffraction intensity.
利用基尔霍夫衍射理论及多点光源的衍射光场非相干叠加方法，对光刻胶表面的衍射光场进行了快速计算机模拟，并与霍普金斯理论计算结果进行了分析比较。