Based on generation and processing of phase conflict graph, a new method is presented to fully and accurately verify the phase compatibility of dark-field standard cell layouts, which are produced according to conventional design rules.
Based on generation and processing of phase conflict graph, a new method is presented to fully and accurately verify the phase compatibility of dark-field standard cell layouts, which are produced according to conventional design rules.
摘要介绍了一套基于相位冲突图的生成和处理的新方法，可以准确、全面地对由传统方法设计的标准单元版图（暗场）进行检查。