This fabrication's main factors were photoresister's reactive light wave length, UV wave length, focusing area and light intensity. This technique could easily fabricate 3D microstructures.
This fabrication's main factors were photoresister's reactive light wave length, UV wave length, focusing area and light intensity. This technique could easily fabricate 3D microstructures.
立体微影加工之主要因素有光阻反应的波长、紫外线光波长、聚焦面积及光强度。目标为传统微机电加工难以达成之三维微结构加工。